2022, Vol. 3, Issue 1, Part A
On optimization of manufacturing of a fully differential amplifier based on heterostructures to increase density of their elements. Influence of miss-match induced stress and porosity of materials on technological process
Author(s): EL Pankratov
Abstract: In this paper we introduce an approach to increase density of field-effect transistors in the framework of a fully differential amplifier. In the framework of the approach we consider manufacturing the inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed in the framework of optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.
Pages: 61-71 | Views: 747 | Downloads: 218
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How to cite this article:
EL Pankratov. On optimization of manufacturing of a fully differential amplifier based on heterostructures to increase density of their elements. Influence of miss-match induced stress and porosity of materials on technological process. Journal of Mathematical Problems, Equations and Statistics. 2022; 3(1): 61-71.